Structural and optical properties of n-type and p-type GaAs(1−x)Bi x thin films grown by molecular beam epitaxy on (311)B GaAs substrates

نویسندگان

چکیده

In this paper, we report on the structural and optical properties of n-type Si-doped p-type Be-doped GaAs(1−x)Bix thin films grown by molecular beam epitaxy (311)B GaAs substrates with nominal Bi content x=5.4%. Similar samples without were also for comparison purposes (n-type GaAs). X-ray diffraction, micro-Raman at room temperature, photoluminescence (PL) measurements as a function temperature laser excitation power (PEXC) performed to investigate their properties. diffraction results revealed that incorporation in both doped GaAsBi was similar, despite present remarkable differences number related defects, non-radiative centers alloy disorder. Particularly, our evidence Bi-related defects n- p-doped alloys have important impact

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ژورنال

عنوان ژورنال: Semiconductor Science and Technology

سال: 2021

ISSN: ['0268-1242', '1361-6641']

DOI: https://doi.org/10.1088/1361-6641/abf3d1